Acetron launches the world's most efficient MOCVD reactor CRIUS® II-XL

Following the successful launch of CRIUS ® II-L, Ai Siqiang announced on November 8 that the capacity of the MOCVD reactor will be further enhanced. The new CRIUS ® II-XL reactor in the 19x4 inch specification delivers exceptional productivity and production and capacity in the world. In addition, the CRIUS II-XL offers optimized operating costs and floor benefits in its class.

The CRIUS ® II-XL is primarily based on the hardware configuration of the CRIUS ® II-L. “The only component that needs to be replaced is the susceptor base. After replacing this part, the reactor capacity will be greatly improved, and basically no additional cost” Ace Strong Close Coupled Showerhead ® (CCS) near coupling technology sprinkler Dr. Johannes Lindner, Project Manager for Reactor Technology, said, “This is one of the key design criteria for CRIUS ® II-L to be upgraded as smoothly as possible to CRIUS ® II-XL. In addition, very little process adjustment is required. Upgrade to CRIUS ® II-XL."

The latest models in this CRIUS ® reactor range are also developed based on detailed analysis of market requirements, especially for LED manufacturing costs. “There is a strong demand for cost-effective LED manufacturing, and we know that MOCVD is significant for cost reduction,” said Dr. Rainer Beccard, vice president of marketing at Axis. “Many of the parameters, reactor capacity versus total cost of ownership. The impact was greatest. Therefore, we decided to design a 19x4 inch reactor that has been fully tested by the Axel application laboratory to ensure that consistency and yield are impeccable in addition to superior capacity. You can choose to use any size wafer between 2 inches and 8 inches. The hardware requires only a simple replacement of the graphite disk, no additional hardware or process adjustments are required."

CRIUS ® II-XL is the latest in the ACSCO CCS product line, which has proven to provide optimum production stability and good operation for years. The standard features of the MOCVD system include the height adjustment of the reactor in place so that the optimum reactor configuration can be selected in any process environment. The system is also equipped with a unique ARGUS in-situ monitoring device.

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